Photolithography Equipment Market to Grow at 8.56% CAGR until 2026
The advent of advanced semiconductor manufacturing technologies, growth in demand from semiconductor market, and augmented government support for carrying out these advancements to drive the growth of the global photolithography equipment market through 2026.
According to TechSci Research report, “Global Photolithography Equipment Market By Type (EUV (Extreme Ultraviolet), DUV (Deep Ultraviolet), I-line, ArF (Argon fluoride), ArFi (Argon fluoride immersion), KrF (Krypton fluoride)), By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm), By Device Wavelength (Mercury Lamps, Flourine Lamps, Excimer Lasers, Lased Produced Plasma), By End-Use (IDMs (Integrated Device Manufacturer), Foundries), By Application (Front End, Back End), By Region, Competition, Forecast & Opportunities, 2026”, Global photolithography equipment market was valued at USD11.26 billion in 2020 and is projected to grow at a CAGR of around 8.56% during the forecast period, owing to the mounting demands of IC chips from the semiconductor industry, budding adoption of digital distribution, high demand from IoT sector, and increased government support for carrying out these advancements. Additionally, expansion in the demand from the semiconductor market and requirement in the IT and automobile sector is also expected to drive the market. To meet the rising technological demands across the globe, ASML has been a continuous market leader for the past ten years and the company proves to be a boon for the photolithography equipment market on the account of its high reliability. However, high manufacturing and R&D costs and costs for equipment, raw material, maintenance, facilities, and labor charges can hamper the growth of the market. Additionally, market manufacturers rely on raw materials and labor for efficient production so process overheads can further restrict the evolution of the market.
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The global photolithography equipment market is segmented based on Type, Wavelength, Device Wavelength, End-Use, Application, Region, and Company. Based on region, the market can be fragmented into Asia Pacific, Europe, North America, South America, and Middle East & Africa. Europe contributes the highest share of 35.99% in the market and is expected to grow at a significant pace on account of its high technological ventures’ new user engagement and because of high consumer demands.
Based on wavelength, the market can be divided into 370nm-270nm, 270-170nm,170-1nm. The 170nm-1nm segment dominates the market with a share of 41.27% in 2020, primarily due to its special feature that can implement structures minutely with full accuracy and precision and due to the increasing number of smartphones and PCs, etc., as photolithography is used when it comes to the production of IC chips.
Based on device wavelength, the market can be apportioned into Mercury Lamps, Flourine Lamps, Excimer Lasers, Laser Produced Plasma. The Laser produced plasma segment dominates the market with a share of 36.42% in 2020 due to its firing high-intensity beams of light, and because they have been used to create short bursts of x-rays to accelerate particles which are called plasma-based accelerators.
Based on end-use, the market can be split up into IDMs, and Foundries. The IDM segment dominates the market with a share of 54.99% in 2020 as they perform both the functions, design as well as manufacture the IC chips.
Based on application, the market can be apportioned into Front-end and Back-end. The Front-end segment dominates the market with a share of 51.73% in 2020 because in the frontend type, the construction of the components of the IC is directly done inside the wafer without covering the wafer, which makes the pattern more precise.
ASML, Canon, Nikon, EV Group, Global Foundries, Eulithia AG are some of the leading players which are operating in the global photolithography equipment market. ASML here plays a role of a monopoly market contributing to the highest share of 91.6% in the market with its major customers being Samsung, Intel, and TSMC. ASML has been the key market player for the past 10 years and is expected to lead the market in the future as well on account of its high reliability and importer satisfaction. These companies are launching highly reliable, photolithography techniques with progressive instruction sets, technologically advanced light beam techniques with high frequency, accuracy, and precision. The companies operating in the market are using organic strategies such as new product launches and merges & collaborations to boost their shares in the market and meet consumer demands.
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“Global photolithography equipment market is anticipated to grow at a significant pace during the forecast period due to the increasing technological advancements, new customer engagement, need of semiconductor IC chips in numerous sectors, increased government investments for photolithography equipment.”, said Mr. Karan Chechi, Research Director with TechSci Research, a research based global management consulting firm.
Global Photolithography Equipment Market By Type (EUV(Extreme Ultraviolet), DUV(Deep Ultravoilet), I-line, ArF(Argon fluoride), ArFi(Argon fluoride immersion), KrF(Krypton fluoride)), By Wavelength (370nm-270nm,270nm-170nm-70nm-1nm), By Device Wavelength (Mercury Lamps, Flourine Lamps, Excimer Lasers, Lased Produced Plasma), By End-Use (IDMs(Integrated Device Manufacturer), Foundries), By Application (Front End, Back End), By Region, By Company, Forecast & Opportunities 2026-2026F”, has evaluated the future growth potential of the global photolithography equipment market and provides statistics and information on market size, structure, and future market growth. The report intends to provide cutting-edge market intelligence and help decision-makers take sound investment decisions. Besides, the report also identifies and analyzes the emerging trends along with essential drivers, challenges, and opportunities in the global photolithography equipment market.
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